Field Guide to Optical Lithography
Chris A. Mack
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Contents
- Symbol Glossary
- The Lithgraphy Process
- Image Formation
- Imaging into a Photoresist
- Photoresist Chemistry
- Lithography Control and Optimization
- Equation Summary
- Glossary
- Index
カテゴリー:
年:
2006
版:
Spi
出版社:
SPIE Publications
言語:
english
ページ:
136
ISBN 10:
0819462071
ISBN 13:
9780819462077
シリーズ:
SPIE Vol. FG06
ファイル:
PDF, 3.30 MB
IPFS:
,
english, 2006